Chemical vapor deposition (CVD) is a chemical process used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit film. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
CVD is used in the production of large sheets of high quality graphene on Cu. This process is typically used when large areas of material are needed versus large amounts of small graphene flakes. The graphene and other 2D materials produced by CVD growth are used for flat panel displays, heat distribution, filter material and more where single layer is important and large sheets are critical. The systems can produce up to 30″ diagonal sheets or 6″ wide sheets in roll to roll format.